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modified chemical vapour deposition
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Figure 12: The preparation of graded-index optical fibre, using the modified chemical vapour deposition (MCVD) technique. A carrier gas of oxygen (O2) is bubbled through liquid silicon tetrachloride (SiCl4), phosphorus trichloride (PoCl3), and germanium tetrachloride (GeCl4). The resulting vapours are mixed in suitable proportions in a flow controller and then fed through a vapour inlet into a silica tube. Heat generated by a traversing oxygen and hydrogen (O2 and H2) torch sets off a vapour phase reaction in which a soot, containing silica as well as oxides of phosphorus and germanium, is deposited in a series of porous layers on the inside of the tube. The layers are dehydrated by gaseous sulfur oxychloride (SOCl2), and various exhaust products are vented through a vapour exhaust. The layers are then sintered, collapsed under vacuum, and condensed to concentric core and cladding layers of the desired refractive properties.
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modified chemical vapour deposition

chemistry
Also known as: MCVD
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Figure 12: The preparation of graded-index optical fibre, using the modified chemical vapour deposition (MCVD) technique. A carrier gas of oxygen (O2) is bubbled through liquid silicon tetrachloride (SiCl4), phosphorus trichloride (PoCl3), and germanium tetrachloride (GeCl4). The resulting vapours are mixed in suitable proportions in a flow controller and then fed through a vapour inlet into a silica tube. Heat generated by a traversing oxygen and hydrogen (O2 and H2) torch sets off a vapour phase reaction in which a soot, containing silica as well as oxides of phosphorus and germanium, is deposited in a series of porous layers on the inside of the tube. The layers are dehydrated by gaseous sulfur oxychloride (SOCl2), and various exhaust products are vented through a vapour exhaust. The layers are then sintered, collapsed under vacuum, and condensed to concentric core and cladding layers of the desired refractive properties.
Figure 12: The preparation of graded-index optical fibre, using the modified chemical vapour deposition (MCVD) technique. A carrier gas of oxygen (O2) is bubbled through liquid silicon tetrachloride (SiCl4), phosphorus trichloride (PoCl3), and germanium tetrachloride (GeCl4). The resulting vapours are mixed in suitable proportions in a flow controller and then fed through a vapour inlet into a silica tube. Heat generated by a traversing oxygen and hydrogen (O2 and H2) torch sets off a vapour phase reaction in which a soot, containing silica as well as oxides of phosphorus and germanium, is deposited in a series of porous layers on the inside of the tube. The layers are dehydrated by gaseous sulfur oxychloride (SOCl2), and various exhaust products are vented through a vapour exhaust. The layers are then sintered, collapsed under vacuum, and condensed to concentric core and cladding layers of the desired refractive properties.

Modified Chemical Vapor Deposition (MCVD) is a technique used in the fabrication of graded-index optical fibers. This process involves mixing silicon tetrachloride vapors with other chemicals like phosphorus oxychloride and germanium or boron trichloride. When heated to high temperatures (1,300°–1,600° C), these vapors react to form a soot containing silica and other oxides. This soot is then deposited onto a cooler substrate, forming multiple layers. After dehydration and sintering, the composition of these layers is controlled by the initial chloride mix to achieve the desired refractive index for the optical fiber. The resulting glass preform is then heated and drawn into a fiber, with its diameter precisely controlled.1

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2 Britannica Sources
  1. industrial glass - Fabrication
  2. crystal - Growth from the melt

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