ion implantation

Ion implantation is a process used to modify the surface characteristics of materials, particularly semiconductors like silicon. It involves bombarding a solid with energetic ions from particle accelerators. This process is a form of doping, where impurities are deliberately added to a semiconductor to alter its electrical conductivity.123

Depending on the dopant's atomic structure, ion implantation can create either an n-type semiconductor (with excess electrons) or a p-type semiconductor (with electron "holes"). This controlled introduction of impurities allows for precise modification of surface properties without affecting the bulk material. Ion implantation is a key technique in the fabrication of electronic devices.12