diffusion layer

In electronics, a "diffusion layer" refers to the area within a semiconductor where implanted atoms have spread into the surrounding material after an annealing process. This process, called implantation, involves bombarding a wafer's surface with atoms to alter its electrical characteristics, creating n-type or p-type semiconductor regions.1

The diffusion layer is a result of annealing, which repairs crystal lattice damage caused by implantation. During annealing, the implanted atoms move, or diffuse, into adjacent areas. This diffusion is a key aspect of modifying semiconductor properties for devices like transistors and diodes, which are fundamental components of integrated circuits. The controlled addition of impurities, known as doping, is essential for tailoring a semiconductor's conductivity.123