physical vapour deposition

Physical Vapor Deposition (PVD) is a technology used to produce thin films, typically less than one micrometer thick. PVD methods involve creating a vapor from a solid material and then depositing that vapor onto a substrate.1

Two common PVD techniques are:
* Laser Ablation: A high-energy laser removes material from a target, which then travels through a vapor to be deposited on a substrate.1
* Sputtering: Energetic electrons bombard a target's surface, dislodging material that forms a vapor and deposits on a nearby substrate.1

These techniques offer precise control for creating advanced materials, such as thin films for electronic and photonic applications.1