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Why did silicon replace germanium in many semiconductor devices?

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A periodic table element square for silicon shows atomic number 14, symbol Si, atomic weight range, electron configuration, and name. Icons indicate it is a solid nonmetal with diamond crystal structure and equal relative strength. Labels explain each property. — silicon Chemical properties of the element silicon.

Silicon replaced germanium as the primary material for semiconductor devices for several key reasons:

Thermal Stability: Silicon devices can operate at significantly higher temperatures than those made of germanium. While germanium diodes are limited to approximately 85 °C (185 °F), silicon diodes can function at temperatures up to 200 °C (400 °F).1
Leakage Currents: Devices fabricated from silicon exhibit much lower leakage currents than their germanium counterparts, making them more suitable for a wider range of applications.2
Insulating Properties: Unlike germanium, silicon forms a high-quality, tenaciously adhering oxide film (silicon dioxide) when heated in the presence of oxygen. This film serves as an excellent electrical insulator and a critical mask during the photolithographic manufacturing process, enabling the creation of complex integrated circuits.21
Abundance and Cost: Silicon is much more abundant in the Earth's crust than germanium, which makes it a more cost-effective raw material for large-scale manufacturing.1

These advantages allowed silicon technology to become the industry standard, currently accounting for more than 95 percent of all semiconductor products sold worldwide.2